Low Scattering Substrate

OPSP - WSSP

Low Scattering Substrate
Out of stock
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OPSP - WSSP
We can provide special optical polishing service for optics or wedge substrate that achieve surface roughness of <0.2nm (Ra). These low scattering substrates are in high demand for high power laser and X-ray applications.
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Name Diameter φD Material Delivery Price Add to cart
i
Low Scattering Substrate Synthetic Fused Silica 50.0mm Diamter 5mm Thick λ/10
OPSQSP-50C05-10-5
50mm Synthetic fused silica
2 weeks
$525.00
Material Synthetic fused silica
Surface roughness <0.2nm(Ra)
Type Optical Parallel
Diameter φD φ50mm
Thickness t 5mm
Surface Flatness λ/10
Parallelism <5″
Surface Quality (Scratch-Dig) 10−5
i
Low Scattering Substrate CaF2 30.0mm Diameter
OPCFSP-30C05-10-5
30mm CaF2
6-12 weeks
$551.00
Material CaF2
Surface roughness <0.2nm(Ra)
Type Optical Parallel
Diameter φD φ30mm
Thickness t 5mm
Surface Flatness λ/10
Parallelism <5″
Surface Quality (Scratch-Dig) 20−10
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Low Scattering Synthetic Fused Silica Wedge 50mm Diameter 1 Degree Wedge λ/10
WSSQSP-50C08-10-1
50mm Synthetic fused silica
2 weeks
$914.00
Material Synthetic fused silica
Surface roughness <0.2nm(Ra)
Type Wedge
Diameter φD φ50mm
Thickness t 8mm
Surface Flatness λ/10
Wedge angle 1°±5′
Surface Quality (Scratch-Dig) 10−5
i
Low Scattering MgF2 Substrate 30.0mm Diameter
OPMFSP-30C05-10-5
30mm MgF2
6-12 weeks
$840.00
Material MgF2
Surface roughness <0.2nm(Ra)
Type Optical Parallel
Diameter φD φ30mm
Thickness t 5mm
Surface Flatness λ/10
Parallelism <5″
Surface Quality (Scratch-Dig) 20−10
i
Low Scattering Substrate Synthetic Fused Silica 30.0mm Diamter 3mm Thick λ/10
OPSQSP-30C03-10-5
30mm Synthetic fused silica
6-12 weeks
$294.00
Material Synthetic fused silica
Surface roughness <0.2nm(Ra)
Type Optical Parallel
Diameter φD φ30mm
Thickness t 3mm
Surface Flatness λ/10
Parallelism <5″
Surface Quality (Scratch-Dig) 10−5
i
Low Scattering Synthetic Fused Silica Wedge 30mm Diameter 1 Degree Wedge λ/10
WSSQSP-30C05-10-1
30mm Synthetic fused silica
6-12 weeks
$420.00
Material Synthetic fused silica
Surface roughness <0.2nm(Ra)
Type Wedge
Diameter φD φ30mm
Thickness t 5mm
Surface Flatness λ/10
Wedge angle 1°±5′
Surface Quality (Scratch-Dig) 10−5
i
Low Scattering MgF2 Substrate 25.4mm Diameter
OPMFSP-25.4C05-10-5
25.4mm MgF2
6-12 weeks
$735.00
Material MgF2
Surface roughness <0.2nm(Ra)
Type Optical Parallel
Diameter φD φ25.4mm
Thickness t 5mm
Surface Flatness λ/10
Parallelism <5″
Surface Quality (Scratch-Dig) 20−10
i
Low Scattering MgF2 Wedge 30mm Diameter 1 Degree Wedge Angle λ/10
WSMFSP-30C05-10-1
30mm MgF2
6-12 weeks
$967.00
Material MgF2
Surface roughness <0.2nm(Ra)
Type Wedge
Diameter φD φ30mm
Thickness t 5mm
Surface Flatness λ/10
Wedge angle 1°±5′
Surface Quality (Scratch-Dig) 20−10
i
Low Scattering Substrate Synthetic Fused Silica 30.0mm Diamter 5mm Thick λ/10
OPSQSP-30C05-10-5
30mm Synthetic fused silica
2 weeks
$315.00
Material Synthetic fused silica
Surface roughness <0.2nm(Ra)
Type Optical Parallel
Diameter φD φ30mm
Thickness t 5mm
Surface Flatness λ/10
Parallelism <5″
Surface Quality (Scratch-Dig) 10−5
i
Low Scattering Substrate CaF2 25.4mm Diameter
OPCFSP-25.4C05-10-5
25.4mm CaF2
6-12 weeks
$499.00
Material CaF2
Surface roughness <0.2nm(Ra)
Type Optical Parallel
Diameter φD φ25.4mm
Thickness t 5mm
Surface Flatness λ/10
Parallelism <5″
Surface Quality (Scratch-Dig) 20−10
i
Low Scattering CaF2 Wedge 30mm Diameter 1 Degree Wedge Angle λ/10
WSCFSP-30C05-10-1
30mm CaF2
6-12 weeks
$651.00
Material CaF2
Surface roughness <0.2nm(Ra)
Type Wedge
Diameter φD φ30mm
Thickness t 5mm
Surface Flatness λ/10
Wedge angle 1°±5′
Surface Quality (Scratch-Dig) 20−10
i
Low Scattering Substrate Synthetic Fused Silica 25.4mm Diamter 5mm Thick λ/10
OPSQSP-25.4C05-10-5
25.4mm Synthetic fused silica
in stock
$263.00
Material Synthetic fused silica
Surface roughness <0.2nm(Ra)
Type Optical Parallel
Diameter φD φ25.4mm
Thickness t 5mm
Surface Flatness λ/10
Parallelism <5″
Surface Quality (Scratch-Dig) 10−5

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◦Use a wedged substrate for a beamsplitter to prevent effects of back reflection.
◦CaF2 (calcium fluoride) and MgF2(magnesium fluoride) are mainly used in UV and IR for its high transmittance.
◦Our highly technical processing yields low surface roughness (microscopic irregularities) and precision surface accuracy (flatness of whole surface).

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