Low Scattering Synthetic Fused Silica Wedge 50mm Diameter 1 Degree Wedge λ/10
WSSQSP-50C08-10-1
We can provide special optical polishing service for optics or wedge substrate that achieve surface roughness of <0.2nm (Ra). These low scattering substrates are in high demand for high power laser and X-ray applications.
◦Use a wedged substrate for a beamsplitter to prevent effects of back reflection.
◦CaF2 (calcium fluoride) and MgF2(magnesium fluoride) are mainly used in UV and IR for its high transmittance.
◦Our highly technical processing yields low surface roughness (microscopic irregularities) and precision surface accuracy (flatness of whole surface).
◦CaF2 (calcium fluoride) and MgF2(magnesium fluoride) are mainly used in UV and IR for its high transmittance.
◦Our highly technical processing yields low surface roughness (microscopic irregularities) and precision surface accuracy (flatness of whole surface).
| Name | Low Scattering Synthetic Fused Silica Wedge 50mm Diameter 1 Degree Wedge λ/10 |
|---|---|
| Weight | 0.0350kgs |
| Standard Coatings Available | Yes |
| Guide |
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| Remark | - |
| Attention |
|
| Diameter φD | 50mm |
| Material | Synthetic fused silica |
| Material | Synthetic fused silica |
| Surface roughness | ＜0.2nm(Ra) |
| Type | Wedge |
| Diameter φD | φ50mm |
| Thickness t | 8mm |
| Surface Flatness | λ/10 |
| Wedge angle | 1°±5′ |
| Surface Quality (Scratch-Dig) | 10−5 |
Out of stock
SKU
WSSQSP-50C08-10-1
€820.30
We can provide special optical polishing service for optics or wedge substrate that achieve surface roughness of <0.2nm (Ra). These low scattering substrates are in high demand for high power laser and X-ray applications.
